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Wet processes

  Wet Processes
Wet processing, i.e., processing with liquid chemicals (solvents, acids or bases), is regularly used for surface cleaning to certify a reproducible result in a subsequent deposition process, such as epitaxial growth, thin deposition or oxidation.

Wet processing could also be used in photoresist processing or to etch topographic structures.

 
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 NameManufacturerModel
DetailsRinser 2VerteqVerteq
DetailsR/D CleanHmabridge Ltd4"-8", No metals
DetailsWetb-diff-cleanWet bench CleanWet bench Clean and IMEC
DetailsW0607Wet bench HF cleanWet bench HF clean and HF doped
DetailsWetb Si processWet bench oxideWet bench oxide,HF 1:10,BHF,HFmix
DetailsWetb Si stripWet bench developerPhotoresist processing.
DetailsW1718Wet benchWet bench
DetailsWetb MEMSWet benchTMAH, HF, KOH
DetailsWetb metalWet benchAu/metal etch
DetailsWetb solventWet benchRemover, Vax, Au module
DetailsWetb Au developWet benchWet bench
DetailsW2631Wet benchWet bench spray etch (GaAs).
DetailsW3233Wet benchWet bench lift off.
DetailsW34Wet benchWet bench Lithografi
DetailsFH APLFume hoodFume hood
DetailsWetb SiCWet bench Substrate cleaning
DetailsWetb APL-gulWet benchWet bench
DetailsRinser 1VerteqVerteq
DetailsR/D doubleSemitoolSemitool Double 870S
DetailsR/D 3VerteqVerteq
DetailsFH III/VPM PlastDragskåp
DetailsR/D Gul1FSI PhoenixFSI Phoenix 4"
DetailsR/D 2VerteqVerteq 4"
DetailsFH wet chemistry-1PM PlastDragskåp solvent (for service work)
DetailsR/D MetalsSemitoolSemitool 4" Metals
DetailsR/D GoldFSI PhoenixFSI Phoenix 4" Au/Lift-Off
DetailsFH wet chemistry-2PM PlastDragskåp solvent
DetailsFH wet chemistry-3PM PlastDragskåp solvent
DetailsFH wet chemistry-4PM PlastDragskåp solvent
DetailsFH wet chemistry-5PM PlastDragskåp solvent
DetailsFH wet chemistry-6PM PlastDragskåp solvent
DetailsMegasonic bathPCTPCT 24 wet bench
DetailsFH epi servicePM PlastDragskåp för epi rengöring
DetailsWetb SabinaPM Plast2 HP, Developer, Sink
DetailsFH wet chemistry-7PM PLastDragskåp
DetailsFH wet chemistry-8PM PlastDragskåp