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Thin film deposition

  Thin Film Deposition
Thin films of metals, dielectrics and insulators are deposited on a vide variety of substrates, with high precision in thickness and composition.

Different deposition methods are used to customize the best film to your specific demands.

We offer films by sputtering, low pressure chemical vapor deposition (LPCVD), thermal and electron beam evaporation and plasma enhanced chemical vapor deposition (PECVD).

 
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 NameManufacturerModel
DetailsSTSSTSPECVD
DetailsBarbaraProvacPAK 600 Coating System
DetailsIndiraBalzersBA 510 Thermal Evaporator
DetailsZitaBalzersBAE 250 Coating System
DetailsPekkaPlasmalab80Plus (Oxford PECVD System) Chamber A
DetailsIBSCommonwealth Scientific CorporationIon Beam Sputtering Tool
DetailsKDFKDF844GT
DetailsAJA SputterAJA InternationalATC Orion-8
DetailsEdvardEdvards160
DetailsALDBENEQTFS200
DetailsAJA Sputter AlbanovaAJA International Inc.Orion
DetailsEdwards Auto 306 AlbanovaEdwardsAuto306 with FL400 chamber
DetailsEurovac UHV deposit, AlbanovaEurovac/ThermionicsCustom made
DetailsSputnik AlbanovaThermionics + otherCustom made
DetailsPLDNeocera IncNeocera Pioneer 180 UHV PLD
DetailsEnduraApplied MaterialsPVD