MC2’s two strategic focus areas have recently resulted in the launch of two processing lines in the Laboratory to complement the flexible processing and materials environment. The lines increase the quality, throughput, and stability of the microwave & nano/quantum devices and components fabricated in the Laboratory. Read more about the lines via the menu to the left.
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Pictures and specifications of our equipment can be found here.
Electron Beam Lithography
Chalmers and MC2 have many years of experience and are extremely competent in the use of electron beam lithography. Chalmers is the clear leader in EBL in Scandinavia. Currently two JEOL systems are in operation in the cleanroom, including a JBX 9300FS currently writing features down to 8 nm. EBL is one of the most popular processing services that the Laboratory provides to commercial and academic clients, patterning a wide variety of substrates for diverse applications.
Thin Film Deposition
A wide variety of metal and insulating thin films can be deposited by a number of evaporation and sputter systems.
The Laboratory has a wide assortment of plasma tools for dry etching and deposition.
Chalmers has the ability to thermally process Si wafers up to 150 mm in diameter in its 4 four-stack Centrotherm E2000 furnaces capable of LPCVD, oxidation, drive-in, and annealing.
MBE of III-V materials
An EPI 930 MBE system is used in the Laboratory predominantly to grow III-V based heterostructures for microwave device applications. The following material combinations are possible: Ga, Al, In / N, P, As
Microwave & Photonic Processing Line
The microwave and photonic processing line consists of a complete set of process tools for the fabrication of microwave and photonic devices and components. Process tools which make up the line are either strictly limited to microwave/photonic devices, or have a limited number of approved processes which have been demonstrated to not have any adverse effects on microwave/photonic processing. The line has resulted in improved stability, quality, and yield in the complicated process flows used in wide bandgap, low-noise, photonic, and terahertz devices. These are finding use in, for example, space applications for projects run through the European Space Agency. The materials processed on this line are predominantly SiC, GaN, and InP based MMICs as well as GaAs based VCSELs.
Nano & Quantum Technology Line
The nano & quantum technology line serves to increase the Laboratory’s ability to produce state-of-the-art superconducting and quantum devices and novel nano components in higher yield. The line is anchored around Chalmers’ long history and competence within electron beam lithography. Particular focus is being laid on attaining high yield on structures smaller than 20nm. With research and development in nanotechnology booming, this process line positions Chalmers to continue to be innovative for years to come. A very broad range of applications is served by this line, from bioelectronics to single electron devices.