Silicon

We offer a world-class facility for growth of crystal structures in Silicon and Silicon-Germanium, which together with high resolution steppers and laser beam lithography secures extremely accurate control of both vertical and lateral dimensions. In addition we provide conventional furnace stacks for oxidation, diffusion and deposition, together with reliable and flexible processes for plasma enhanced deposition of dielectrics, spin-on polymers, metallization, anneal, a wide range of tools for dry and wet etching with highest precision, wafer bonding and chip handling.