A new tool, for conventional vapour priming and image reversal, was recently installed at MSL. Image reversal is a process where exposed areas of positive resist remain after processing (thus behaving like a negative resist). This offers several advantages, such as:
Better resolution compared to negative resist.
Negative sidewall profile suitable for liftoff processing.
Possibility to control sidewall profile with exposure dose.
Possibility to get positive or negative images with the same mask independent of...
ÅAC Microtec has created a new laboratory for development and production of electronic modules in the MSL cleanroom.
May 21-25 the Ångström Laboratory, in collaboration with CEI-Europe, will give the course Thin Film Deposition at the Nanoscale: Mechanisms and Applications
Lecture by Claes Djurberg, UU Innovation: "10 Misunderstandings about Patents" (in Swedish). Thursday May 26 at 12:00 in the Hägg Hall.
Anders Persson: "Magnetoresistance and Space - Micro- and Nanofeature Sensors Designed, Manufactured and Evaluated for Space Magnetic Field Investgations". Wednesday June 1 at 9:15 in the Siegbahn Hall. Opponent: Prof Johan Åkerman, Dept of Physics, University of Gothenburg.
Sebastian Schleussner: "ZrN Back-Contact Reflectors and Ga Gradients in Cu(In,Ga)Se2 Solar Cells". Tuesday May 31 at 9:30 in Å80101. Opponent: Dr Dieter Schmid, DSiTec, Munich, Germany.